Tantalum Sputtering Target
video
Tantalum Sputtering Target

Tantalum Sputtering Target

Tantalum (Ta) is a refractory metal that is critical for microchip architectures in the high-growth semiconductor industry. High purity Tantalum targets are used to sputter microscopic thin layers of Tantalum on silicon wafers, enabling the fabrication of next-generation semiconductor logic...

Description

Tantalum (Ta) is a refractory metal that is critical for microchip architectures in the high-growth semiconductor industry. High purity Tantalum targets are used to sputter microscopic thin layers of Tantalum on silicon wafers, enabling the fabrication of next-generation semiconductor logic chips with advanced node architectures and higher performance.

Products Description

Tantalum is classified as a transition metal in the periodic table and is considered to be one of the most highly corrosion-resistant refractory metals. Tantalum has a melting point of 3,017°C, a density of 16.6 g/cc, and a vapor pressure of 10-4 Torr at 2,590°C. It has a metallic grayish-blue color and is chemically surprisingly similar to niobium. Because of its non-toxic nature, it is used primarily in the manufacture of surgical implants. It is also used as a capacitor in electronics and can be alloyed with other metals for added strength and durability. Tantalum, its alloys and compounds are evaporated under vacuum to make semiconductors, optical coatings, magnetic storage media, and wear- and corrosion-resistant coatings.

Top quality metal products

Tantalum Sputtering Target

Tantalum (Ta) Specifications

Material Type Tantalum
Symbol Ta
Atomic Weight 180.94788
Atomic Number 73
Color/Appearance Gray Blue, Metallic
Thermal Conductivity 57 W/m.K
Melting Point (°C) 3,017
Coefficient of Thermal Expansion 6.3 x 10-6/K

 

about us

 

Tantalum Sputtering Target

 Established in 2008, the company has grown over the years to become a leading manufacturer and supplier of metal products serving a wide range of industries. The company continuously invests in research and development to improve the quality and durability of its products. The company places great emphasis on customer satisfaction and is known for providing high quality products and excellent customer service. Today, the company has a global presence and serves customers in countries all over the world.

Hot Tags: tantalum sputtering target, China tantalum sputtering target manufacturers, suppliers, factory, titanium, tantalum alloy for corner applications, high quality tantalum alloy, tantalum alloy in medical devices, tantalum alloy for high pressure flow applications, tantalum alloy for manufacturing, tantalum alloy for normal pressure flow applications

(0/10)

clearall